Variation in plutonium dioxide sputter yields for 1–5 keV Ar+ ions
Author(s) -
Scott Donald,
Jeff A. Stanford,
R. Gollott,
David J. Roberts,
A. J. Nelson,
William McLean
Publication year - 2020
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0000301
Subject(s) - sputtering , ion , materials science , range (aeronautics) , oxide , ion beam , atomic physics , angle of incidence (optics) , analytical chemistry (journal) , sputter deposition , chemistry , thin film , optics , physics , nanotechnology , metallurgy , organic chemistry , chromatography , composite material
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