Open AccessVariation in plutonium dioxide sputter yields for 1–5 keV Ar+ ions
Author(s) -
Scott B. Donald,
Jeff A. Stanford,
Rory Gollott,
Daniel M. Roberts,
A. J. Nelson,
W. McLean
Publication year - 2020
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0000301
Subject(s) - sputtering , ion , materials science , range (aeronautics) , oxide , ion beam , atomic physics , angle of incidence (optics) , analytical chemistry (journal) , sputter deposition , chemistry , thin film , optics , physics , nanotechnology , metallurgy , organic chemistry , chromatography , composite material