Open AccessControlled removal of hydrogen atoms from H-terminated silicon surfaces
Author(s) -
Hamed Alemansour,
S. O. Reza Moheimani,
James H. G. Owen,
John N. Randall,
Ehud Fuchs
Publication year - 2020
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/6.0000241
Subject(s) - silicon , dangling bond , scanning tunneling microscope , materials science , fabrication , biasing , desorption , hydrogen , optoelectronics , nanotechnology , lithography , voltage , chemistry , adsorption , physics , medicine , alternative medicine , organic chemistry , pathology , quantum mechanics