Open AccessAtomic layer etching of metals with anisotropy, specificity, and selectivity
Author(s) -
Xia Sang,
Yantao Xia,
Philippe Sautet,
Jane P. Chang
Publication year - 2020
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0000225
Subject(s) - etching (microfabrication) , reactivity (psychology) , ion , materials science , selectivity , isotropic etching , metal , anisotropy , layer (electronics) , plasma etching , nanotechnology , chemistry , analytical chemistry (journal) , metallurgy , optics , organic chemistry , catalysis , physics , medicine , alternative medicine , pathology