Open AccessPatterning nickel for extreme ultraviolet lithography mask application. II. Hybrid reactive ion etch and atomic layer etch processing
Author(s) -
Xia Sang,
Jane P. Chang
Publication year - 2020
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0000191
Subject(s) - reactive ion etching , materials science , etching (microfabrication) , layer (electronics) , ultraviolet , lithography , nickel , dry etching , nanotechnology , optoelectronics , metallurgy