Open AccessSimple masking method for selective atomic layer deposition of thin films
Author(s) -
Sarah Hashemi Astaneh,
Cortino Sukotjo,
Christos G. Takoudis,
Alan Feinerman
Publication year - 2020
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/6.0000146
Subject(s) - wafer , materials science , atomic layer deposition , substrate (aquarium) , thin film , x ray photoelectron spectroscopy , scanning electron microscope , silicon , layer (electronics) , masking (illustration) , optoelectronics , analytical chemistry (journal) , nanotechnology , chemical engineering , composite material , chemistry , art , oceanography , visual arts , chromatography , geology , engineering
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