Open AccessSimple masking method for selective atomic layer deposition of thin films
Author(s) -
Sarah Hashemi Astaneh,
Cortino Sukotjo,
Christos G. Takoudis,
Alan Feinerman
Publication year - 2020
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/6.0000146
Subject(s) - wafer , substrate (aquarium) , materials science , atomic layer deposition , x ray photoelectron spectroscopy , thin film , masking (illustration) , scanning electron microscope , layer (electronics) , silicon , analytical chemistry (journal) , optoelectronics , nanotechnology , chemical engineering , chemistry , composite material , art , oceanography , visual arts , chromatography , engineering , geology