Open AccessO·, H·, and ·OH radical etching probability of polystyrene obtained for a radio frequency driven atmospheric pressure plasma jet
Author(s) -
V. S. Santosh K. Kondeti,
Yaguo Zheng,
Pingshan Luan,
Gottlieb S. Oehrlein,
Peter Bruggeman
Publication year - 2020
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/6.0000123
Subject(s) - polystyrene , etching (microfabrication) , jet (fluid) , analytical chemistry (journal) , atmospheric pressure plasma , materials science , atmospheric pressure , radical , plasma etching , chemistry , polymer , plasma , layer (electronics) , composite material , thermodynamics , organic chemistry , physics , meteorology , quantum mechanics