Atomic layer deposition of HfO2 films using carbon-free tetrakis(tetrahydroborato)hafnium and water | Zendy

Devika Choudhury | Zendy; David J. Mandia | Zendy; Ryan R. Langeslay | Zendy; Angel YanguasGil | Zendy; Steven Letourneau | Zendy; Alfred P. Sattelberger | Zendy; Mahalingam Balasubramanium | Zendy; Anil U. Mane | Zendy; Massimiliano Delferro | Zendy; Jeffrey W. Elam | Zendy

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Atomic layer deposition of HfO2 films using carbon-free tetrakis(tetrahydroborato)hafnium and water

Author(s) -

Devika Choudhury,

David J. Mandia,

Ryan R. Langeslay,

Angel YanguasGil,

Steven Letourneau,

Alfred P. Sattelberger,

Mahalingam Balasubramanium,

Anil U. Mane,

Massimiliano Delferro,

Jeffrey W. Elam

Publication year - 2020

Publication title -

journal of vacuum science and technology a vacuum surfaces and films

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.583

H-Index - 112

eISSN - 1520-8559

pISSN - 0734-2101

DOI - 10.1116/6.0000053

Subject(s) - analytical chemistry (journal) , ellipsometry , hafnium , thin film , amorphous solid , x ray photoelectron spectroscopy , materials science , fourier transform infrared spectroscopy , atomic layer deposition , quartz crystal microbalance , x ray reflectivity , chemistry , zirconium , crystallography , chemical engineering , nanotechnology , adsorption , chromatography , engineering , metallurgy

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