Open AccessOptimal placement of droplets for UV nanoimprint lithography
Author(s) -
Yang Ban,
Roger T. Bonnecaze
Publication year - 2020
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/6.0000030
Subject(s) - materials science , capillary action , nanoimprint lithography , coalescence (physics) , capillary pressure , mechanics , anisotropy , lithography , microfluidics , fluid dynamics , flow (mathematics) , nanotechnology , optics , composite material , optoelectronics , porous medium , physics , medicine , alternative medicine , pathology , fabrication , astrobiology , porosity
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