Open AccessHigh-aspect-ratio nanophotonic components fabricated by Cl2 reactive ion beam etching
Author(s) -
W. J. Zubrzycki,
G.A. Vawter,
J. R. Wendt
Publication year - 1999
Publication title -
journal of vacuum science and technology b microelectronics and nanometer structures processing measurement and phenomena
Language(s) - Uncategorized
Resource type - Journals
eISSN - 1520-8567
pISSN - 1071-1023
DOI - 10.1116/1.591055
Subject(s) - materials science , reactive ion etching , trench , etching (microfabrication) , nanophotonics , optics , beam divergence , beam (structure) , aspect ratio (aeronautics) , optoelectronics , ion beam , focused ion beam , ion , beam diameter , nanotechnology , chemistry , physics , laser , laser beams , organic chemistry , layer (electronics)
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