Open AccessSi/SiO2 interface studies by spectroscopic immersion ellipsometry and atomic force microscopy
Author(s) -
Q. Liu,
J. F. Wall,
E. A. Irene
Publication year - 1994
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.579081
Subject(s) - overlayer , suboxide , materials science , ellipsometry , silicon , atomic force microscopy , surface finish , surface roughness , analytical chemistry (journal) , thin film , nanotechnology , composite material , optoelectronics , chemistry , chromatography
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