Open AccessSystem for deposition and hydriding of thin metallic films without air exposure
Author(s) -
Chad C. Eichman,
J. L. Comeau,
K. R. Rinehuls
Publication year - 1975
Publication title -
journal of vacuum science and technology
Language(s) - English
Resource type - Journals
eISSN - 2331-1754
pISSN - 0022-5355
DOI - 10.1116/1.568587
Subject(s) - outgassing , materials science , thin film , substrate (aquarium) , vacuum chamber , deposition (geology) , crucible (geodemography) , erbium , vacuum deposition , glovebox , metallurgy , composite material , optoelectronics , nanotechnology , chemistry , paleontology , oceanography , computational chemistry , organic chemistry , doping , sediment , geology , biology
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