Open AccessElectron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si3N4 and Si etching
Author(s) -
Chen Li,
Valery Godyak,
Thorsten Hofmann,
Klaus Edinger,
Gottlieb S. Oehrlein
Publication year - 2020
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.5143537
Subject(s) - atomic physics , plasma , electron cyclotron resonance , electron , cathode , secondary electrons , argon , materials science , langmuir probe , secondary emission , energy dispersive x ray spectroscopy , ionization , chemistry , plasma diagnostics , scanning electron microscope , physics , ion , organic chemistry , quantum mechanics , composite material