Open AccessChemical vapor deposition of metallic films using plasma electrons as reducing agents
Author(s) -
Hama Nadhom,
Daniel Lundin,
Polla Rouf,
Henrik Pedersen
Publication year - 2020
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.5142850
Subject(s) - metal , materials science , chemical vapor deposition , thin film , molecule , plasma , valence electron , argon , deposition (geology) , reducing agent , electron , chemical engineering , valence (chemistry) , catalysis , nanotechnology , inorganic chemistry , chemistry , metallurgy , organic chemistry , paleontology , physics , quantum mechanics , sediment , engineering , biology
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