Open AccessIn vacuo atomic layer deposition and electron tunneling characterization of ultrathin dielectric films for metal/insulator/metal tunnel junctions
Author(s) -
Judy Wu,
Jagaran Acharya,
Ryan Goul
Publication year - 2020
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.5141078
Subject(s) - quantum tunnelling , materials science , atomic layer deposition , optoelectronics , molecular beam epitaxy , dielectric , insulator (electricity) , sputter deposition , nanotechnology , thin film , epitaxy , sputtering , layer (electronics)