Open AccessSub-rf period electrical characterization of a pulsed capacitively coupled argon plasma
Author(s) -
Alex Press,
Matthew Goeckner,
Lawrence Overzet
Publication year - 2019
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.5132753
Subject(s) - materials science , transient (computer programming) , plasma , fast fourier transform , argon , plasma diagnostics , harmonic , electrical impedance , capacitively coupled plasma , optoelectronics , physics , acoustics , inductively coupled plasma , atomic physics , computer science , algorithm , quantum mechanics , operating system
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