Open AccessUnderstanding the role of rf-power on AlN film properties in hollow-cathode plasma-assisted atomic layer deposition
Author(s) -
Saidjafarzoda Ilhom,
Deepa Shukla,
Adnan Mohammad,
John Grasso,
Brian G. Willis,
Necmi Bıyıklı
Publication year - 2020
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.5128663
Subject(s) - materials science , ellipsometry , analytical chemistry (journal) , wurtzite crystal structure , thin film , atomic layer deposition , plasma , quartz crystal microbalance , crystallite , nitride , chemisorption , plasma enhanced chemical vapor deposition , saturation (graph theory) , layer (electronics) , chemistry , nanotechnology , adsorption , zinc , physics , quantum mechanics , mathematics , chromatography , combinatorics , metallurgy