Understanding the role of rf-power on AlN film properties in hollow-cathode plasma-assisted atomic layer deposition | Zendy

Saidjafarzoda Ilhom | Zendy; Deepa Shukla | Zendy; Adnan Mohammad | Zendy; John Grasso | Zendy; Brian G. Willis | Zendy; Necmi Bıyıklı | Zendy

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Understanding the role of rf-power on AlN film properties in hollow-cathode plasma-assisted atomic layer deposition

Author(s) -

Saidjafarzoda Ilhom,

Deepa Shukla,

Adnan Mohammad,

John Grasso,

Brian G. Willis,

Necmi Bıyıklı

Publication year - 2020

Publication title -

journal of vacuum science and technology a vacuum surfaces and films

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.583

H-Index - 112

eISSN - 1520-8559

pISSN - 0734-2101

DOI - 10.1116/1.5128663

Subject(s) - materials science , ellipsometry , analytical chemistry (journal) , wurtzite crystal structure , thin film , atomic layer deposition , plasma , quartz crystal microbalance , crystallite , nitride , chemisorption , plasma enhanced chemical vapor deposition , saturation (graph theory) , layer (electronics) , chemistry , nanotechnology , adsorption , zinc , physics , quantum mechanics , mathematics , chromatography , combinatorics , metallurgy

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