Open AccessRole of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
Author(s) -
David R. Boris,
Virginia D. Wheeler,
Jason R. Avila,
S. B. Qadri,
Charles R. Eddy,
Scott G. Walton
Publication year - 2019
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.5128208
Subject(s) - molecular beam epitaxy , crystallinity , thin film , epitaxy , analytical chemistry (journal) , plasma , inductively coupled plasma , chemical vapor deposition , atomic layer deposition , remote plasma , atomic layer epitaxy , sapphire , layer (electronics) , materials science , chemistry , chemical engineering , optoelectronics , nanotechnology , crystallography , optics , organic chemistry , laser , physics , quantum mechanics , engineering