Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy | Zendy

David R. Boris | Zendy; Virginia D. Wheeler | Zendy; Jason R. Avila | Zendy; S. B. Qadri | Zendy; Charles R. Eddy | Zendy; Scott G. Walton | Zendy

Open Access

Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy

Author(s) -

David R. Boris,

Virginia D. Wheeler,

Jason R. Avila,

S. B. Qadri,

Charles R. Eddy,

Scott G. Walton

Publication year - 2019

Publication title -

journal of vacuum science and technology a vacuum surfaces and films

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.583

H-Index - 112

eISSN - 1520-8559

pISSN - 0734-2101

DOI - 10.1116/1.5128208

Subject(s) - molecular beam epitaxy , crystallinity , thin film , epitaxy , analytical chemistry (journal) , plasma , inductively coupled plasma , chemical vapor deposition , atomic layer deposition , remote plasma , atomic layer epitaxy , sapphire , layer (electronics) , materials science , chemistry , chemical engineering , optoelectronics , nanotechnology , crystallography , optics , organic chemistry , laser , physics , quantum mechanics , engineering

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research