Open AccessSidewall channel fabrication using membrane projection lithography and metal assisted chemical etching
Author(s) -
Rimjhim Chaudhary,
Gyuseok Kim,
Hiromichi Yamamoto,
George Watson
Publication year - 2019
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.5123622
Subject(s) - resist , fabrication , materials science , electron beam lithography , isotropic etching , etching (microfabrication) , lithography , substrate (aquarium) , dry etching , perpendicular , reactive ion etching , optoelectronics , membrane , x ray lithography , photolithography , nanolithography , nanotechnology , chemistry , layer (electronics) , medicine , oceanography , alternative medicine , geometry , mathematics , pathology , geology , biochemistry