Sidewall channel fabrication using membrane projection lithography and metal assisted chemical etching | Zendy

Rimjhim Chaudhary | Zendy; Gyuseok Kim | Zendy; Hiromichi Yamamoto | Zendy; G. P. Watson | Zendy

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Sidewall channel fabrication using membrane projection lithography and metal assisted chemical etching

Author(s) -

Rimjhim Chaudhary,

Gyuseok Kim,

Hiromichi Yamamoto,

G. P. Watson

Publication year - 2019

Publication title -

journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.429

H-Index - 119

eISSN - 2166-2754

pISSN - 2166-2746

DOI - 10.1116/1.5123622

Subject(s) - materials science , resist , fabrication , electron beam lithography , etching (microfabrication) , isotropic etching , lithography , substrate (aquarium) , nanolithography , dry etching , perpendicular , optoelectronics , reactive ion etching , photolithography , nanotechnology , membrane , x ray lithography , layer (electronics) , medicine , oceanography , alternative medicine , geometry , mathematics , pathology , geology , biology , genetics

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