Open AccessCharge-induced pattern displacement in E-beam lithography
Author(s) -
Kerim T. Arat,
Thomas Klimpel,
A.C. Zonnevylle,
Wilhelmus S. M. M. Ketelaars,
C. Th. H. Heerkens,
K. HAGEN
Publication year - 2019
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.5120631
Subject(s) - electron beam lithography , monte carlo method , materials science , deflection (physics) , resist , lithography , distortion (music) , beam (structure) , cathode ray , optics , electron , nanotechnology , physics , optoelectronics , amplifier , statistics , mathematics , cmos , layer (electronics) , quantum mechanics
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