Open AccessInvestigation of ma-N 2400 series photoresist as an electron-beam resist for superconducting nanoscale devices
Author(s) -
Emily Toomey,
Marco Colangelo,
Karl K. Berggren
Publication year - 2019
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.5119516
Subject(s) - resist , photoresist , nanowire , hydrogen silsesquioxane , materials science , electron beam lithography , nanotechnology , fabrication , optoelectronics , superconductivity , layer (electronics) , medicine , alternative medicine , pathology , quantum mechanics , physics