Open AccessBBr3 as a boron source in plasma-assisted molecular beam epitaxy
Author(s) -
Richard C. Cramer,
J. H. English,
Bastien Bonef,
James S. Speck
Publication year - 2019
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.5117240
Subject(s) - molecular beam epitaxy , boron , materials science , impurity , crystal (programming language) , thin film , crystal growth , epitaxy , analytical chemistry (journal) , chemistry , nanotechnology , crystallography , environmental chemistry , organic chemistry , layer (electronics) , computer science , programming language