Open AccessNeural network-based model of photoresist reflow
Author(s) -
Charmaine Chia,
Joel Martis,
Stefanie S. Jeffrey,
Roger T. Howe
Publication year - 2019
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.5116857
Subject(s) - photoresist , artificial neural network , materials science , minification , fabrication , scalar (mathematics) , polymer , measure (data warehouse) , work (physics) , computer science , biological system , mechanical engineering , composite material , artificial intelligence , mathematics , engineering , geometry , data mining , layer (electronics) , medicine , alternative medicine , pathology , biology , programming language
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