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Plasma-enhanced atomic layer deposition of vanadium nitride
Author(s) -
Alexander C. Kozen,
Mark Sowa,
Ling Ju,
Nicholas C. Strandwitz,
Guosong Zeng,
Tomas F. Babuska,
Zakaria Hsain,
Brandon A. Krick
Publication year - 2019
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.5109671
Subject(s) - atomic layer deposition , vanadium , x ray photoelectron spectroscopy , deposition (geology) , materials science , vanadium nitride , crystallinity , analytical chemistry (journal) , nitride , layer (electronics) , chemical engineering , metallurgy , nanotechnology , chemistry , composite material , organic chemistry , paleontology , sediment , engineering , biology

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