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RF-plasma MBE growth of epitaxial metallic TaNx transition metal nitride films on SiC
Author(s) -
D. Scott Katzer,
Neeraj Nepal,
Matthew T. Hardy,
Brian P. Downey,
David F. Storm,
Eric N. Jin,
David J. Meyer
Publication year - 2019
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.5089779
Subject(s) - materials science , epitaxy , molecular beam epitaxy , transmission electron microscopy , electron diffraction , substrate (aquarium) , sheet resistance , optoelectronics , thin film , reflection high energy electron diffraction , crystallography , diffraction , analytical chemistry (journal) , nanotechnology , optics , chemistry , layer (electronics) , oceanography , chromatography , geology , physics

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