Open AccessLow temperature chemical vapor deposition of superconducting vanadium nitride thin films
Author(s) -
Elham Mohimi,
Zhejun V. Zhang,
Justin Mallek,
Sumeng Liu,
Brian B. Trinh,
Pralav P. Shetty,
Gregory S. Girolami,
John R. Abelson
Publication year - 2019
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.5088050
Subject(s) - x ray photoelectron spectroscopy , analytical chemistry (journal) , materials science , vanadium , vanadium nitride , chemical vapor deposition , thin film , nanocrystalline material , nitride , carbon fibers , chemistry , chemical engineering , nanotechnology , metallurgy , layer (electronics) , chromatography , composite number , engineering , composite material
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