Open AccessSilicon nanocone formation via low-energy helium ion sputtering
Author(s) -
T.J. Novakowski,
J. Tripathi,
A. Hassanein
Publication year - 2018
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.5040765
Subject(s) - irradiation , materials science , ion , sputtering , silicon , analytical chemistry (journal) , anti reflective coating , helium , absorption (acoustics) , range (aeronautics) , optoelectronics , atomic physics , thin film , nanotechnology , chemistry , coating , physics , organic chemistry , chromatography , nuclear physics , composite material
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom