Open AccessIn situ XPS study on atomic layer etching of Fe thin film using Cl2 and acetylacetone
Author(s) -
Xi Lin,
Meixi Chen,
Anderson Janotti,
R. L. Opila
Publication year - 2018
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.5039517
Subject(s) - x ray photoelectron spectroscopy , acetylacetone , etching (microfabrication) , halogen , layer (electronics) , chemistry , substrate (aquarium) , metal , transition metal , thin film , chlorine , decomposition , molecule , density functional theory , analytical chemistry (journal) , inorganic chemistry , materials science , chemical engineering , nanotechnology , computational chemistry , organic chemistry , catalysis , alkyl , oceanography , engineering , geology
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