Open AccessAtomic layer deposition of CeO2 using a heteroleptic cyclopentadienyl-amidinate precursor
Author(s) -
Maryam Golalikhani,
Trevor E. James,
Peter Van Buskirk,
Wontae Noh,
JooHo Lee,
Ziyun Wang,
Jeffrey F. Roeder
Publication year - 2018
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.5026405
Subject(s) - atomic layer deposition , cerium , crystallite , stoichiometry , x ray photoelectron spectroscopy , materials science , thermal stability , cyclopentadienyl complex , chemical vapor deposition , layer (electronics) , deposition (geology) , oxygen , cerium oxide , thin film , analytical chemistry (journal) , inorganic chemistry , oxide , chemical engineering , chemistry , nanotechnology , catalysis , metallurgy , organic chemistry , paleontology , sediment , engineering , biology