Open AccessReactive sputter deposition of piezoelectric Sc0.12Al0.88N for contour mode resonators
Author(s) -
Michael David Henry,
Travis Ryan Young,
E Douglas,
Benjamin A. Griffin
Publication year - 2018
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.5023918
Subject(s) - materials science , sputtering , piezoelectricity , microelectromechanical systems , sputter deposition , composite material , stress (linguistics) , deposition (geology) , optoelectronics , resonator , tin , silicon , etching (microfabrication) , thin film , nanotechnology , metallurgy , paleontology , linguistics , philosophy , layer (electronics) , sediment , biology
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