Open AccessDeposition and characterization of nickel gallium thin films
Author(s) -
Shidong He,
A. Pfau,
J. Trey Diulus,
Gustavo H. Albuquerque,
Gregory S. Herman
Publication year - 2018
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.5023688
Subject(s) - x ray photoelectron spectroscopy , materials science , gallium , nanocrystalline material , thin film , annealing (glass) , nickel , chemical engineering , analytical chemistry (journal) , metallurgy , nanotechnology , chemistry , chromatography , engineering