Open AccessCoefficient of thermal expansion and biaxial Young's modulus in Si-rich silicon nitride thin films
Author(s) -
S. Habermehl
Publication year - 2018
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.5020432
Subject(s) - materials science , amorphous solid , silicon nitride , thermal expansion , thin film , silicon , nanocrystalline silicon , composite material , nitride , chemical vapor deposition , analytical chemistry (journal) , amorphous silicon , crystallography , crystalline silicon , nanotechnology , metallurgy , chemistry , layer (electronics) , chromatography
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom