Open AccessAtomic layer deposition of PbTiO3 and PbZrxTi1-xO3 films using metal alkyl and alkylamide precursors
Author(s) -
Nick M. Sbrockey,
Gary S. Tompa,
Robert M. Lavelle,
Kathleen A. Trumbull,
Mark A. Fanton,
David W. Snyder,
Ronald G. Polcawich,
Daniel M. Potrepka
Publication year - 2018
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.5014030
Subject(s) - atomic layer deposition , zirconium , titanate , materials science , inorganic chemistry , metal , oxide , titanium , thin film , chemical engineering , chemistry , nanotechnology , metallurgy , ceramic , engineering