Open AccessStudy of the high-temperature oxidation resistance mechanism of magnetron sputtered Hf7B23Si17C4N45 film
Author(s) -
Minghui Zhang,
J. C. Jiang,
Petr Zeman,
Š. Zuzjaková,
Jaroslav Vlček,
Efstathios I. Meletis
Publication year - 2017
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.5004145
Subject(s) - materials science , amorphous solid , nucleation , sputter deposition , ostwald ripening , nanoparticle , chemical engineering , nanocomposite , microstructure , surface diffusion , sputtering , thin film , nanotechnology , composite material , crystallography , chemistry , adsorption , organic chemistry , engineering