Open AccessDesign and characterization of a microreactor for spatially confined atomic layer deposition and in situ UHV surface analysis
Author(s) -
Jiun-Ruey Chen,
Wenyu Zhang,
Rambert K. Nahm,
Michael A. DiFeo,
J. R. Engstrom
Publication year - 2017
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.4996553
Subject(s) - microreactor , atomic layer deposition , deposition (geology) , characterization (materials science) , substrate (aquarium) , x ray photoelectron spectroscopy , torr , chemistry , vacuum chamber , layer (electronics) , in situ , analytical chemistry (journal) , nanotechnology , materials science , chemical engineering , thermodynamics , catalysis , composite material , paleontology , biochemistry , oceanography , physics , organic chemistry , chromatography , sediment , geology , engineering , biology