Design and characterization of a microreactor for spatially confined atomic layer deposition and in situ UHV surface analysis | Zendy

Jiun-Ruey Chen | Zendy; Wenyu Zhang | Zendy; Rambert K. Nahm | Zendy; Michael A. DiFeo | Zendy; J. R. Engstrom | Zendy

Open Access

Design and characterization of a microreactor for spatially confined atomic layer deposition and in situ UHV surface analysis

Author(s) -

Jiun-Ruey Chen,

Wenyu Zhang,

Rambert K. Nahm,

Michael A. DiFeo,

J. R. Engstrom

Publication year - 2017

Publication title -

journal of vacuum science and technology. a. vacuum, surfaces, and films

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.583

H-Index - 112

eISSN - 1520-8559

pISSN - 0734-2101

DOI - 10.1116/1.4996553

Subject(s) - microreactor , atomic layer deposition , deposition (geology) , characterization (materials science) , substrate (aquarium) , x ray photoelectron spectroscopy , torr , chemistry , vacuum chamber , layer (electronics) , in situ , analytical chemistry (journal) , nanotechnology , materials science , chemical engineering , thermodynamics , catalysis , composite material , paleontology , biochemistry , oceanography , physics , organic chemistry , chromatography , sediment , geology , engineering , biology

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