Open AccessIsofocal dose based proximity effect correction tolerance to the effective process blur
Author(s) -
Gerald G Lopez,
Mohsen Azadi,
Meredith Metzler,
Nikola Belic,
Ulrich Hofmann
Publication year - 2017
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.4995421
Subject(s) - resist , optics , electron beam lithography , materials science , lithography , depth of focus (tectonics) , cathode ray , physics , electron , nanotechnology , subduction , layer (electronics) , biology , tectonics , quantum mechanics , paleontology
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