Open AccessUltradeep electron cyclotron resonance plasma etching of GaN
Author(s) -
S. E. Harrison,
Lars F. Voss,
Andrea M. Torres,
Clint D. Frye,
Qinghui Shao,
Rebecca J. Nikolić
Publication year - 2017
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.4994829
Subject(s) - electron cyclotron resonance , materials science , etching (microfabrication) , surface roughness , plasma , etch pit density , optoelectronics , dry etching , plasma etching , microstructure , surface finish , analytical chemistry (journal) , layer (electronics) , nanotechnology , composite material , chemistry , physics , quantum mechanics , chromatography