Open AccessNanoimprint lithography tone reversal process using poly(methyl methacrylate) and hydrogen silsesquioxane
Author(s) -
Long Chang,
Dmitri Litvinov
Publication year - 2017
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.4993562
Subject(s) - hydrogen silsesquioxane , materials science , nanoimprint lithography , silsesquioxane , lithography , grating , methyl methacrylate , chemical mechanical planarization , optoelectronics , reactive ion etching , resist , etching (microfabrication) , nanotechnology , polymer , electron beam lithography , polymerization , composite material , layer (electronics) , fabrication , medicine , alternative medicine , pathology
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