Open AccessCrosslinkable photoacid generators for ultrahigh loading in epoxide functionalized molecular resists
Author(s) -
Hannah Narcross,
Brandon Sharp,
Laren M. Tolbert,
Clifford L. Henderson
Publication year - 2017
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.4991894
Subject(s) - sulfonium , epoxide , resist , cationic polymerization , chemistry , polymer chemistry , electron beam lithography , photochemistry , salt (chemistry) , organic chemistry , catalysis , layer (electronics)