Open AccessFabrication of hard x-ray zone plates with high aspect ratio using metal-assisted chemical etching
Author(s) -
Kenan Li,
Michael Wojcik,
Ralu Divan,
Leonidas E. Ocola,
Bing Shi,
Daniel Rosenmann,
Chris Jacobsen
Publication year - 2017
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.4991794
Subject(s) - etching (microfabrication) , wafer , zone plate , materials science , silicon , nanolithography , optics , aspect ratio (aeronautics) , fabrication , isotropic etching , substrate (aquarium) , fresnel zone , chemical vapor deposition , x ray optics , optoelectronics , monocrystalline silicon , diffraction , nanotechnology , layer (electronics) , x ray , physics , pathology , oceanography , geology , medicine , alternative medicine