Fabrication of hard x-ray zone plates with high aspect ratio using metal-assisted chemical etching | Zendy

Kenan Li | Zendy; Michael Wojcik | Zendy; Ralu Divan | Zendy; Leonidas E. Ocola | Zendy; Bing Shi | Zendy; Daniel Rosenmann | Zendy; Chris Jacobsen | Zendy

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Fabrication of hard x-ray zone plates with high aspect ratio using metal-assisted chemical etching

Author(s) -

Kenan Li,

Michael Wojcik,

Ralu Divan,

Leonidas E. Ocola,

Bing Shi,

Daniel Rosenmann,

Chris Jacobsen

Publication year - 2017

Publication title -

journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.429

H-Index - 119

eISSN - 2166-2754

pISSN - 2166-2746

DOI - 10.1116/1.4991794

Subject(s) - materials science , etching (microfabrication) , wafer , zone plate , nanolithography , silicon , optics , fabrication , aspect ratio (aeronautics) , x ray optics , substrate (aquarium) , isotropic etching , fresnel zone , chemical vapor deposition , optoelectronics , monocrystalline silicon , diffraction , x ray , nanotechnology , layer (electronics) , medicine , oceanography , physics , alternative medicine , pathology , geology

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