Open AccessComparison study of the low temperature growth of dilute GeSn and Ge
Author(s) -
Perry C. Grant,
Wei Dou,
Bader Alharthi,
Joshua M. Grant,
Aboozar Mosleh,
Wei Du,
Baohua Li,
Mansour Mortazavi,
Hameed A. Naseem,
Shui-Qing Yu
Publication year - 2017
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.4990773
Subject(s) - germane , nucleation , volumetric flow rate , materials science , growth rate , chemical vapor deposition , tin , crystal growth , exothermic reaction , germanium , analytical chemistry (journal) , chemical engineering , chemistry , crystallography , nanotechnology , optoelectronics , metallurgy , thermodynamics , organic chemistry , mathematics , silicon , physics , geometry , engineering