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Growth of coherent BGaN films using BBr3 gas as a boron source in plasma assisted molecular beam epitaxy
Author(s) -
Richard C. Cramer,
Bastien Bonef,
J. H. English,
Cyrus E. Dreyer,
Chris G. Van de Walle,
James S. Speck
Publication year - 2017
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.4986185
Subject(s) - molecular beam epitaxy , wurtzite crystal structure , materials science , thin film , gallium nitride , sapphire , boron nitride , epitaxy , crystal (programming language) , optoelectronics , crystal growth , optics , crystallography , nanotechnology , laser , chemistry , zinc , metallurgy , physics , layer (electronics) , programming language , computer science

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