Open AccessPredicting synergy in atomic layer etching
Author(s) -
Keren J. Kanarik,
Samantha Tan,
Wenbing Yang,
Taeseung Kim,
Thorsten Lill,
Alexander Kabansky,
Eric A. Hudson,
T. Ohba,
Kazuo Nojiri,
Jengyi Yu,
Rich Wise,
Ivan L. Berry,
Yang Pan,
Jeffrey M. Marks,
Richard A. Gottscho
Publication year - 2017
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.4979019
Subject(s) - etching (microfabrication) , layer (electronics) , plasma etching , materials science , plasma , semiconductor , nanotechnology , dielectric , optoelectronics , physics , quantum mechanics
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