Open AccessTop-down technique for scaling to nano in silicon MEMS
Author(s) -
Mustafa Yılmaz,
Yasin Kılınç,
Gokhan Nadar,
Zuhal Taşdemir,
Nicole Wollschläger,
W. Österle,
Yusuf Leblebici,
B. Erdem Alaca
Publication year - 2017
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.4978047
Subject(s) - microelectromechanical systems , miniaturization , materials science , nanowire , silicon on insulator , etching (microfabrication) , nanotechnology , lithography , silicon , nanoscopic scale , fabrication , scaling , nano , optoelectronics , composite material , geometry , mathematics , medicine , alternative medicine , layer (electronics) , pathology
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