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Gas-phase diagnostics during H2 and H2O plasma treatment of SnO2 nanomaterials: Implications for surface modification
Author(s) -
Erin P. Stuckert,
Christopher J. Miller,
Ellen R. Fisher
Publication year - 2017
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.4976534
Subject(s) - oxidizing agent , plasma , nanomaterials , surface modification , materials science , phase (matter) , gas phase , etching (microfabrication) , oxygen , plasma processing , nanowire , chemical engineering , plasma cleaning , nanotechnology , chemical physics , analytical chemistry (journal) , chemistry , environmental chemistry , layer (electronics) , physics , organic chemistry , quantum mechanics , engineering

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