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Comparison of scanning laser annealing and microwave annealing for As+ implanted Si
Author(s) -
Zhao Zhao,
Joe Hilman,
Manny Oropeza,
Qiong Nian,
Terry Alford
Publication year - 2016
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.4972051
Subject(s) - annealing (glass) , materials science , dopant , recrystallization (geology) , ion implantation , optoelectronics , wafer , analytical chemistry (journal) , doping , ion , metallurgy , chemistry , paleontology , organic chemistry , chromatography , biology

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