Open AccessActivation of the dimers and tetramers of metal amidinate atomic layer deposition precursors upon adsorption on silicon oxide surfaces
Author(s) -
Bin Chen,
Yichen Duan,
Yunxi Yao,
Qiang Ma,
Jason P. Coyle,
Seán T. Barry,
Andrew V. Teplyakov,
Francisco Zaera
Publication year - 2016
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.4971990
Subject(s) - chemistry , copper , adsorption , x ray photoelectron spectroscopy , oxide , silicon , binding energy , density functional theory , monomer , silicon oxide , desorption , inorganic chemistry , crystallography , computational chemistry , organic chemistry , chemical engineering , polymer , physics , silicon nitride , nuclear physics , engineering