Open AccessAtomic fluorine densities in electron beam generated plasmas: A high ion to radical ratio source for etching with atomic level precision
Author(s) -
David R. Boris,
Tz. B. Petrova,
G. M. Petrov,
Scott G. Walton
Publication year - 2016
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.4971416
Subject(s) - atomic physics , plasma , ion , fluorine , chemistry , atom (system on chip) , etching (microfabrication) , electron density , argon , plasma processing , cathode ray , atomic spectroscopy , electron , spectroscopy , physics , organic chemistry , layer (electronics) , quantum mechanics , computer science , embedded system