Open AccessInductively coupled BCl3/Cl2/Ar plasma etching of Al-rich AlGaN
Author(s) -
E Douglas,
Carlos Sánchez,
Robert Kaplar,
Andrew A. Allerman,
Albert G. Baca
Publication year - 2016
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.4971245
Subject(s) - etching (microfabrication) , inductively coupled plasma , materials science , fabrication , plasma , optoelectronics , analytical chemistry (journal) , plasma etching , etch pit density , nanotechnology , layer (electronics) , chemistry , medicine , physics , alternative medicine , quantum mechanics , pathology , chromatography
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