Open AccessScatterometry for nanoimprint lithography
Author(s) -
Ruichao Zhu,
Steven R. J. Brueck,
Noel Dawson,
Tito Busani,
Praveen Joseph,
Shrawan Singhal,
Sameet Sreenivasan
Publication year - 2016
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.4967933
Subject(s) - materials science , nanoimprint lithography , grating , photoresist , optics , rigorous coupled wave analysis , wavelength , diffraction grating , polarizer , dielectric , optoelectronics , lithography , diffraction , resist , layer (electronics) , nanotechnology , fabrication , medicine , alternative medicine , physics , birefringence , pathology