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Chemical vapor deposition of MnxNy films from bis(2,2,6,6-tetramethylpiperidido)manganese(II) and ammonia
Author(s) -
Elham Mohimi,
Brian B. Trinh,
Shaista Babar,
Gregory S. Girolami,
John R. Abelson
Publication year - 2016
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.4964839
Subject(s) - chemical vapor deposition , x ray photoelectron spectroscopy , manganese , thin film , amorphous solid , stoichiometry , nitride , ammonia , analytical chemistry (journal) , chemistry , inorganic chemistry , materials science , chemical engineering , nanotechnology , crystallography , metallurgy , layer (electronics) , organic chemistry , engineering

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